Mask aligner

  • Sub-micron features with vacuum contact
  • Interchangeable deep UV (254 nm) and near UV (365 nm) optics
  • 4-camera front and back-side alignmentprocessing for small pieces, 50 and 100 mm wafers
  • Configured for 75, 100, and 125 mm masks

Tool Specs

Tool Status Up
Manufacturer OAI
Model MBA 800
Typical Application Optical lithography
Location 6060.11
Related Documents

Standard Operating Procedure

Training Contact Grace Li - li@4dlabs.ca